Effect of annealing temperature on Nickel ferrite (NiFe2O4) thin films by chemical spray pyrolysis
Abstract
Nickel ferrite NiFe2O4 (NFO) thin films were deposited on quartz glass surfaces by spray pyrolysis technique at surface temperature of 300 oC.Deposited films were annealed at four differenttemperatures (500, 550, 600 and 650oC), and the effect of annealing temperature on structural, morphological, optical and electrical properties has been studied. The annealed films were characterized by different characterization techniques like, X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), UV-Visible spectroscopy analysis and current-voltage (I-V). X-ray diffraction (XRD) analysis of NFO films polycrystalline with spinel cubic structure was done. The crystalline size was determined using the Debbie-scherrer formula.This XRD analysis showed that the NFO thin films are uniform in nature and strongly dependent on annealing temperature. SEM micrographs show that the grain size increases with an increase in annealing temperature. AFM analysis showed that the annealed sample has smooth surface which indicates enhancement of crystallization. The optical properties of the films were studied does transmission spectra in the wavelength range of 400 to 700 nm. The results showed that the energy band gap decreased with increasing annealing temperature. Finally, the current voltage responsivity study yielded good results. This sows that this film is useful for device technology. It is suitable for modern electronic device miniaturization
